Via the requested low-temperature-ALD (Atomic Layer Deposition) extension for our current Parylene deposition tool, we want to be able to fabricate a high quality TiO2/Al2O3/TiO2 ALD stack and to combine it with Parylene, in order to obtain an ultra-thin, biocompatible and flexible bi-directional diffusion barrier of superior quality. A profound process optimisation and the possibility of in-situ material deposition including plasma treatments essential for good inter-layer adhesion, will contribute significantly to the barrier quality of the multistack. The resulting diffusion barrier will be an ideal solution for reliable, long term protection of electronic micro-systems for e.g. medical applications (implants, smart contact lenses). Moreover, the newly developed ALD materials will enable novel optical developments too. With the strongly growing interest for electronic implants and smart lenses, the requested new tool will enable us to participate in a wide range of bilateral and new valorisation-driven research projects.